K465i GaN MOCVD Reactor

Application:

Mainly used in the production of LED high brightness blue-green epitaxial chip. The so-called epitaxial wafer is a kind of flake product grown by high-tech growth technology. After the chip device is made and packaged, we are familiar with LED and other light-emitting devices.

It is used in large screen display, traffic signal light, mobile phone background light, etc.

Working principle and instructions:

Turbodisc k465i Gan MOCVD epitaxial growth system can mass produce GaN based blue, green LEDs and blue lasers, as well as Gan power devices. K465i adopts Veeco's most advanced turbodisc reactor technology, and its production capacity is about 50% better than other similar systems.

The equipment consists of the following parts:

Reactor: stainless steel vacuum chamber is the core part of the whole equipment, which provides epitaxial growth environment. With Veeco's patented technology turbo disc cavity design. The heating wire at the bottom provides a high temperature reaction environment above 1000 ℃. The gas distribution plate on the top of the reaction chamber distributes the reaction gas delivered by the gas distribution system to the reaction chamber according to a certain proportion. The motor which can rotate at high speed at the bottom drives the carrier which carries the wafer to rotate at high speed, so that the reaction gas is evenly distributed on the wafer surface and reacts. The modular design of the equipment is implemented: the reaction chamber, wafer transfer system and other components can be separated from the main equipment for easy handling.

Control system: provide control and electrical connection distribution of the whole equipment. It includes the control computer of the main control software nexus, the realtemp controller of the temperature control system, the data server, PLC, DeviceNet, the electrical switch and terminal block of the system, the heating wire heating power box, etc.

Gas distribution system: adjust the flow and pressure of the reaction gas and deliver it to the reaction chamber. Including mass flow controller (MFC), gas pressure controller (PC), metal organic source temperature control system.

Vacuum system: provides the vacuum of the system. Including system pump, auxiliary pump and exhaust system.

Peripheral cooling water system: the cooling circulating water required by the system is provided by two heat exchangers.

Wafer handling system: transport the wafer required for growth to the reaction chamber. Including glove box, loadlock, etc.

Control software: the new control software nexus is used.