Applied Materials P5000 Introduction
The P5000 is the most flexible, successful, single-wafer, multi-chamber CVD and etch system for manufacturing complex devices in high-volume production. As the licensed manufacturer of the Applied Materials P5000, OEM Group provides new and remanufactured P5000 systems, technical support, and software licensing as well as upgrades including chamber additions, upgrade kits, and enhancements.
Benefits:
Production-proven solution
Industry lowest CoO
High Throughput
Applications:
Discretes
MEMS
Optoelectronics
Packaging
Advanced Packaging
Processes:
P5000 Etch
Silicon Oxide、Silicon Nitride、Oxynitride RIE
P5000 CVD
Silane Oxide、Silane Nitride、Oxynitride、TEOS Oxide
Features:
1 – 4 Chambers: Universal Lamp Heated CVD, MxP Etch, MxP+ Etch, eMxP, ASP Asher, Wafer Orienter
Large install base of volume production tools
Standard processes for silicon oxide and nitride
Available 75 to 200 mm wafer transport
Substrate Handling: 75mm – 200mm SiC, Sapphire, Quartz, Ge, GaAs, GaN, Silicon
